| INTRODUCTION
The barrier to greater penetration of laser processing schemes
has been the ability to make a low capacitance, low resistance, ohmic,
high reliability, high yield, high density alternative to laser fuses.
This barrier has now been eliminated due to a new laser formed
MAKELINKTM
that is implemented without any extra processing steps (LOW
COST) and
is directly compatible with standard multi-level interconnect. Furthermore,
the reliability of the laser formed links has been proven to exceed Mil-Hdbk
885-E reliability specification for CLASS B, ground-based
operation. These
links are as good as the metalization being linked. We also have developed
this technology on new metalization systems such as copper and wesee that
MAKELINKTM will soon surpass cutting in all
applications where
post-process
programation is required. The specifications of the linking technology
make it perfect for ANALOG and MIXED-SIGNAL, SoC, and all low-cost technologies
made with standard metallization.
|